High resolution x-ray diffraction to characterize semiconductor materials

X-ray diffraction gives information on the composition and lattice strain of III-V and II-VI ternary and quaternary heteroepitaxial semiconductor layers used in the fabrication of optoeletronic devices. In this article we give a brief introduction to the materials used in technology of III-V optoele...

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Bibliographic Details
Main Authors: Hayashi , Marcelo, Marcon, Rogério, Nunes, Danilo Rocha
Format: Online
Language:Portuguese
Published: Universidade Estadual de Campinas 2020
Subjects:
Online Access:https://econtents.sbu.unicamp.br/inpec/index.php/physicae/article/view/13476
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